Walter J Edmonds

US Patent:

6583427, Jun 24, 2003

Filed:

Aug 31, 2000

Appl. No.:

09/652440

Inventors:

Walter J. Edmonds - Allen TX
Timothy B. Vaughn - Lubbock TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

H01J 2700

US Classification:

25049221, 250426, 250423 R

Abstract:

A liner ( ) for an arc chamber ( ) of an ion implanter. The arc chamber ( ) comprises a liner ( ) on the inner surface ( ) of the arc chamber ( ) that extends the life of the arc chamber ( ). The liner ( ) comprises a one piece portion ( ) that covers the bottom and long sidewalls of the arc chamber ( ) and two end plates ( ) for covering the end walls of the arc chamber ( ). When the liner ( ) wears out it is replaced at a significantly reduced cost compared to replacing the entire arc chamber ( ).

US Patent:

59593962, Sep 28, 1999

Filed:

Oct 16, 1997

Appl. No.:

8/951717

Inventors:

Wylie K. Moreshead - Nevada TX
Walter J. Edmonds - Allen TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

H05H 100

US Classification:

3133631

Abstract:

A suppression electrode assembly (18) comprises an electrode suppression plate (40) constructed of a material having substantial strength and durability and has an aperture seat (76) with an opening (72) defined therein. An aperture insert (80) constructed from graphite is slidably engageable with the aperture seat (76). The aperture insert (80) defines an elongated slit (84) which is in general alignment with the aperture seat opening (72) when the aperture insert (80) is installed in the seat (76).