Robert McFadden - Beaverton OR, US Shurong Liang - Hillsboro OR, US Vitaly Kasperovich - Hillsboro OR, US Mandyam Sriram - Beaverton OR, US
International Classification:
C23C016/00
US Classification:
118715000, 427248100
Abstract:
Improvements in a PECVD chamber to provide better uniformity in film thickness and mechanical strength are described. Less contact surface is provided to the outer edge of the wafer and non-uniform gas distribution occurs through adjustments to the gas distribution plate to provide this uniformity.