Robert F Koefer

US Patent:

8427639, Apr 23, 2013

Filed:

May 7, 2009

Appl. No.:

12/437091

Inventors:

Martin Moskovits - Santa Barbara CA, US
Thomas Wray Tombler - Somerset NJ, US
Robert Frank Koefer - Whitehall PA, US

Assignee:

Nant Holdings IP, LLC - Los Angeles CA

International Classification:

G01J 3/44

US Classification:

356301

Abstract:

Manufacturing a surface enhanced Raman spectroscopy (SERS) active structure includes exposing a substrate to produce an exposure pattern then etching the substrate based on the exposure pattern to produce a plurality of nanostructure cores having a plurality of sides extending from the substrate. Adjacent nanostructure cores are separated by core gaps. SERS active material is deposited onto the plurality of nanostructure cores producing a structure having gaps suitable for use in a SERS process.

US Patent:

8617799, Dec 31, 2013

Filed:

Sep 21, 2009

Appl. No.:

12/563683

Inventors:

Robert Koefer - Whitehall PA, US
Sheng Liu - Harrison NJ, US
Thomas Tombler - Somerset NJ, US

Assignee:

API Technologies Corp. - South Plainfield NJ

International Classification:

G02B 3/00
G03F 7/20

US Classification:

430321, 430330

Abstract:

In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. In general, in another aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. The first layer is composed of an amorphous material and the first structure is a post having a base side-wall angle of in a range from about 60 degrees to about 80 degrees.

US Patent:

20100073756, Mar 25, 2010

Filed:

Sep 21, 2009

Appl. No.:

12/563597

Inventors:

Martin Moskovits - Santa Barbara CA, US
Qihong Wu - Somerset NJ, US
Robert Koefer - Whitehall PA, US
Xu Zhang - Montville NJ, US
Linh Nguyen - Allentown PA, US
Thomas Tombler - Somerset NJ, US

International Classification:

G02B 26/00

US Classification:

359290

Abstract:

In general, in one aspect, the invention features an apparatus that includes a plurality of optical elements arranged to form an image of an object. The elements include a first element comprising one or more regions of a polarizing material, the regions being shaped as one or more visual features, a polarizer, and a mounting assembly including a first mount for the first element and a second mount for the polarizer. At least the first or second mount is rotatable with respect to an optical axis between a first orientation and a second orientation. In the first orientation, the visual features are visible in the image of the object and, in the second orientation, the visual features are not visible in the image of the object.

US Patent:

20100291489, Nov 18, 2010

Filed:

May 15, 2009

Appl. No.:

12/466853

Inventors:

Martin Moskovits - Santa Barbara CA, US
Linh Nguyen - Allentown PA, US
Robert Koefer - Whitehall PA, US
Qihong Wu - Somerset NJ, US
Xu Zhang - Montville NJ, US

Assignee:

API Nanofabrication and Research Corp. - Somerset NJ

International Classification:

G03F 7/20

US Classification:

430323, 430322, 430325, 430326

Abstract:

Methods include providing an article including a substrate, a first layer supported by the substrate, and an interface between the substrate and the first layer. The substrate is substantially transparent to radiation at a wavelength λ and the first layer is formed from a photoresist. The methods include exposing the first layer to radiation by directing radiation at λ through the substrate to impinge on the interface so that the radiation experiences total internal reflection at the interface.