Search

Kevin W Gotrik

age ~39

from Hudson, WI

Also known as:
  • Kevin Willy Gotrik
Phone and address:
1102 6Th St, Hudson, WI 54016

Kevin Gotrik Phones & Addresses

  • 1102 6Th St, Hudson, WI 54016
  • Cambridge, MA
  • Madison, WI
  • Gretna, NE

Work

  • Company:
    Mit
    May 2008
  • Position:
    Research assistant

Education

  • Degree:
    Doctor of Philosophy (PhD)
  • School / High School:
    Massachusetts Institute of Technology
    2008 to 2013
  • Specialities:
    Materials Science and Engineering

Skills

Matlab • Cad • Cuda C • Mathematica • Electron Beam Lithography • Afm • Sem • Tem • Clean Rooms • He Ion Beam Microscopy • Sputter Deposition • E Beam Evaporation • Lithography • Spectral Reflectometry • Ellipsometry • Reactive Ion Etching • Nexafs • Nanotechnology • Carbon Nanotubes • Simulations • Scanning Electron Microscopy • Materials Science • Latex • Physics • Characterization • Mathematical Modeling • Experimentation • Spectroscopy • Numerical Analysis • Cuda

Languages

German

Industries

Research

Us Patents

  • Removable Templates For Directed Self Assembly

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  • US Patent:
    20130244439, Sep 19, 2013
  • Filed:
    Mar 13, 2013
  • Appl. No.:
    13/800435
  • Inventors:
    Samuel Mospens Nicaise - Cambridge MA, US
    Karl K. Berggren - Arlington MA, US
    Kevin Willy Gotrik - Cambridge MA, US
    Caroline A. Ross - Arlington MA, US
  • Assignee:
    MASSACHUSETTS INSTITUTE OF TECHNOLOGY - Cambridge MA
  • International Classification:
    H01L 21/308
  • US Classification:
    438703
  • Abstract:
    A sacrificial-post templating method is presented for directing block copolymer (BCP) self-assembly to form nanostructures of monolayers and bilayers of microdomains. The topographical post template can be removed after directing self-assembly and, therefore, is not incorporated into the final microdomain pattern. The sacrificial posts can be a material removable using a selective etchant that will not remove the material of the final pattern block(s). The sacrificial posts may be removable, at least in part, using a same etchant as for removing one of the blocks of the BCP, for example, a negative tone polymethylmethacrylate (PMMA) when a non-final pattern block of polystyrene is removed and polydimethylsiloxane (PDMS) remains on the substrate.
  • Retroreflective Article Comprising Discontinuous Binder-Borne Reflective Layers

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  • US Patent:
    20220365260, Nov 17, 2022
  • Filed:
    Sep 29, 2020
  • Appl. No.:
    17/764281
  • Inventors:
    - St. Paul MN, US
    Graham M. Clarke - Woodbury MN, US
    Kevin W. Gotrik - Hudson WI, US
    Michael A. McCoy - St. Paul MN, US
    Christopher A. Merton - St. Louis Park MN, US
    Aaron M. Nash - Columbia Heights MN, US
    Shri Niwas - Maple Grove MN, US
    Anthony F. Schultz - Forest Lake MN, US
    Carla S. Thomas - Woodbury MN, US
    Ying Xia - Woodbury MN, US
    Scott J. Jones - Woodbury MN, US
  • International Classification:
    G02B 5/128
    G02B 1/111
    G02B 1/12
  • Abstract:
    A retroreflective article including a binder layer and a plurality of retroreflective elements. Each retroreflective element includes a transparent microsphere partially embedded in the binder layer and a discontinuous binder-borne reflective layer that is provided by a portion of a fractured binder-borne reflective sheet.
  • Optical Films And Methods Of Manufacturing Such Optical Films

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  • US Patent:
    20220342126, Oct 27, 2022
  • Filed:
    Aug 28, 2020
  • Appl. No.:
    17/753281
  • Inventors:
    - St. Paul MN, US
    Kevin W. Gotrik - Hudson WI, US
    Jeremy K. Larsen - Farmington MN, US
    Caleb T. Nelson - McKinney TX, US
    Daniel J. Schmidt - Woodbury MN, US
    Fei Peng - Southbury CT, US
  • International Classification:
    G02B 5/00
    B29D 11/00
    C23C 18/31
    C23C 18/20
    C23C 18/16
  • Abstract:
    A method of manufacturing an optical film includes providing a base film. The base film includes a substrate defining a first surface and a second surface. The base film also includes a plurality of structures defining an upper surface and at least one side surface extending from the corresponding upper surface to a base portion. The method also includes depositing a catalyst material on each of the plurality of structures and the base portion to form a catalyst layer thereon. The method further includes selectively removing the catalyst layer from the upper surface of each of the plurality of structures and the base portion while retaining an activity of the catalyst layer on the at least one side surface of each of the plurality of structures. The method includes forming a metallic layer on the at least one side surface of each of the plurality of structures.
  • Optical Layers, Films And Systems

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  • US Patent:
    20220308281, Sep 29, 2022
  • Filed:
    Oct 2, 2020
  • Appl. No.:
    17/639025
  • Inventors:
    - St. Paul MN, US
    Gary T. Boyd - Woodbury MN, US
    David A. Rosen - North St. Paul MN, US
    Bharat R. Acharya - Woodbury MN, US
    Kevin W. Gotrik - Hudson WI, US
    David J. Rowe - Roseville MN, US
    Caleb T. Nelson - McKinney TX, US
  • International Classification:
    F21V 8/00
    G02B 5/02
    G02F 1/1333
    G02F 1/1335
  • Abstract:
    An optical system includes an extended illumination source configured to emit light from an extended emission surface thereof and a light redirecting layer disposed on the extended emission surface. The light redirecting layer has a structured major surface that includes a regular array of light redirecting structures, each light redirecting structure including a plurality of facets; and a plurality of discrete spaced apart window segments. The optical system includes a plurality of reflective segments where each reflective segment is disposed on a corresponding window segment. For substantially normally incident light, each reflective segment has a total: average optical reflectance of at least 30% in a visible wavelength range extending from about 420 nm to about 650 nm; and optical transmittance of at least 10% for at least one infrared wavelength in an infrared wavelength range extending from about 800 nm to about 1200 nm.
  • Coated Substrate Comprising Electrically Conductive Particles And Dried Aqueous Dispersion Of Organic Polymer

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  • US Patent:
    20220252770, Aug 11, 2022
  • Filed:
    Jun 3, 2020
  • Appl. No.:
    17/596333
  • Inventors:
    - St. Paul MN, US
    Kevin W. Gotrik - Hudson WI, US
    James E. Lockridge - St. Paul MN, US
    Caleb T. Nelson - Woodbury MN, US
    Bradley L. Givot - St. Paul MN, US
    Morgan A. Priolo - Woodbury MN, US
    Luke A. Schroeder - Maplewood MN, US
  • International Classification:
    G02B 5/20
    G02B 1/04
    G02B 5/00
  • Abstract:
    A light control film is described comprising a light input surface and alight output surface opposite the light input surface; alternating transmissive regions and absorptive regions disposed between the light input surface and the light output surface, wherein the absorptive regions comprise light-absorbing or light-reflecting particles and a dried aqueous dispersion of an organic polymer. The light control film can have improved on-axis transmission in combination with sufficiently high sheet resistance such that the film does not detract from the responsiveness of a touch screen of an electronic device. Also described is a coated article and method of making.
  • High Transmission Light Control Films With Asymmetric Light Output

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  • US Patent:
    20220221624, Jul 14, 2022
  • Filed:
    Jun 11, 2020
  • Appl. No.:
    17/596301
  • Inventors:
    - St. Paul MN, US
    Owen M. Anderson - Minneapolis MN, US
    Kevin W. Gotrik - Hudson WI, US
    Nicholas A. Johnson - Burnsville MN, US
    Kenneth A. P. Meyer - Eagan MN, US
    Caleb T. Nelson - Woodbury MN, US
    Daniel J. Schmidt - Woodbury MN, US
  • International Classification:
    G02B 5/00
    G02B 5/30
  • Abstract:
    Light control films comprise a light input surface and alight output surface opposite the light input surface and alternating transmissive regions and absorptive regions disposed between the light input surface and the light output surface. The absorptive regions have an aspect ratio of at least 30 and are canted in the same direction. The alternating transmissive regions and absorbing regions have a maximum relative transmission at a viewing angle other than 0 degrees.
  • Retroreflective Article Comprising Multiple Layers That Differ In Reflectivity

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  • US Patent:
    20220206195, Jun 30, 2022
  • Filed:
    Apr 24, 2020
  • Appl. No.:
    17/605687
  • Inventors:
    - St. Paul MN, US
    Ying Xia - Woodbury MN, US
    David J. Rowe - Roseville MN, US
    Shri Niwas - Maple Grove MN, US
    Michael A. McCoy - St. Paul MN, US
    Scott J. Jones - Woodbury MN, US
    Kevin W. Gotrik - Hudson WI, US
    Graham M. Clarke - Woodbury MN, US
    Lok-Man Ng - Hsinchu City, Taiwan, CN
  • International Classification:
    G02B 5/124
    G02B 5/128
  • Abstract:
    A retroreflective article including a binder layer and a plurality of retroreflective elements. Each retroreflective element includes a transparent microsphere partially embedded in the binder layer. At least some of the retroreflective elements include a first layer that is disposed between the transparent microsphere and the binder layer and a second layer that is disposed between the transparent microsphere and the binder layer. At least one of the first layer and the second layer is a reflective layer; and, the first reflective layer and the second reflective layer differ in reflectivity. For at least some of the retroreflective elements, at least a portion of the second reflective layer is positioned in-parallel to the first reflective layer.
  • Patterned Article Including Electrically Conductive Elements

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  • US Patent:
    20220183153, Jun 9, 2022
  • Filed:
    May 5, 2020
  • Appl. No.:
    17/602659
  • Inventors:
    - St. Paul MN, US
    John J. Sullivan - Hudson WI, US
    Matthew C. Messina - Maplewood MN, US
    Charles D. Hoyle - Stillwater MN, US
    Jaewon Kim - Woodbury MN, US
    Haiyan Zhang - Lake Elmo MN, US
    Matthew S. Stay - Bloomington MN, US
    Robert A. Sainati - Bloomington MN, US
    Kevin W. Gotrik - Hudson WI, US
    Kenneth A.P. Meyer - Eagan MN, US
    Gregory L. Abraham - Austin TX, US
    Joseph C. Carls - Austin TX, US
    Douglas S. Dunn - Woodbury MN, US
  • International Classification:
    H05K 1/02
    H05K 1/03
    H01Q 1/38
    H05K 3/46
    H05K 3/20
  • Abstract:
    A patterned article includes a unitary polymeric layer and a plurality of electrically conductive elements embedded at least partially in the unitary polymeric layer. Each electrically conductive element includes a conductive seed layer having a top major surface and an opposite bottom major surface in direct contact with the unitary polymeric layer, and includes a metallic body disposed on the top major surface of the conductive seed layer. The metallic body has a bottom major surface and at least one sidewall. The bottom major surface contacts the conductive seed layer. Each sidewall is in direct contact with the unitary polymeric layer and extends from the bottom major surface of the metallic body toward or to, but not past, a top major surface of the unitary polymeric layer. The conductive elements may be electrically isolated from one another. Processes for making the patterned article are described.

Resumes

Kevin Gotrik Photo 1

Senior Research Engineer At 3M

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Location:
Hudson, WI
Industry:
Research
Work:
MIT since May 2008
Research Assistant

Synchrotron Radiation Center Sep 2007 - May 2008
Research Assistant

Fraunhofer Institute for Interfacial Engineering and Biotechnology Jun 2007 - Aug 2007
Research Assistant
Education:
Massachusetts Institute of Technology 2008 - 2013
Doctor of Philosophy (PhD), Materials Science and Engineering
University of Wisconsin-Madison 2003 - 2008
Bachelor of Science (BS), Engineering Physics, Honors in Research
Skills:
Matlab
Cad
Cuda C
Mathematica
Electron Beam Lithography
Afm
Sem
Tem
Clean Rooms
He Ion Beam Microscopy
Sputter Deposition
E Beam Evaporation
Lithography
Spectral Reflectometry
Ellipsometry
Reactive Ion Etching
Nexafs
Nanotechnology
Carbon Nanotubes
Simulations
Scanning Electron Microscopy
Materials Science
Latex
Physics
Characterization
Mathematical Modeling
Experimentation
Spectroscopy
Numerical Analysis
Cuda
Languages:
German

Googleplus

Kevin Gotrik Photo 2

Kevin Gotrik

Lived:
Gretna, Nebraska
Madison, Wisconsin
Dresden, Germany
Stuttgart, Germany
Boston, Massachusetts
Work:
Massachusetts Institute of Technology - PhD Student
Education:
University of Wisconsin-Madison - Engineering Physics
Tagline:
MIT grad student with a knack!

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