Justin S Ghan

US Patent:

8423928, Apr 16, 2013

Filed:

Oct 11, 2011

Appl. No.:

13/271194

Inventors:

Justin Ghan - Berkeley CA, US
Abdurrahman Sezginer - Monte Sereno CA, US

Assignee:

Cadence Design Systems, Inc. - San Jose CA

International Classification:

G06F 17/50

US Classification:

716 55

Abstract:

Some embodiments provide a method for optimally decomposing patterns within particular spatial regions of interest on a particular layer of a design layout for a multi-exposure photolithographic process. Specifically, some embodiments model the spatial region using a mathematical equation in terms of two or more intensities. Some embodiments then optimize the model across a set of feasible intensities. The optimization yields a set of intensities such that the union of the patterns created/printed from each exposure intensity most closely approximates the patterns within the particular regions. Based on the set of intensities, some embodiments then determine a decomposition solution for the patterns that satisfies design constraints of a multi-exposure photolithographic printing process. In this manner, some embodiments achieve an optimal photolithographic printing of the particular regions of interest without performing geometric rule based decomposition.

US Patent:

20100037200, Feb 11, 2010

Filed:

Aug 11, 2008

Appl. No.:

12/189692

Inventors:

Justin Ghan - Berkeley CA, US
Abdurrahman Sezginer - Monte Sereno CA, US

International Classification:

G06F 17/50

US Classification:

716 21

Abstract:

Some embodiments provide a method for optimally decomposing patterns within particular spatial regions of interest on a particular layer of a design layout for a multi-exposure photolithographic process. Specifically, some embodiments model the spatial region using a mathematical equation in terms of two or more intensities. Some embodiments then optimize the model across a set of feasible intensities. The optimization yields a set of intensities such that the union of the patterns created/printed from each exposure intensity most closely approximates the patterns within the particular regions. Based on the set of intensities, some embodiments then determine a decomposition solution for the patterns that satisfies design constraints of a multi-exposure photolithographic printing process. In this manner, some embodiments achieve an optimal photolithographic printing of the particular regions of interest without performing geometric rule based decomposition.

US Patent:

20150186582, Jul 2, 2015

Filed:

Dec 19, 2014

Appl. No.:

14/577901

Inventors:

- Veldhoven, NL
Justin GHAN - Fremont CA, US
David Harold WHYSONG - Dublin CA, US

Assignee:

ASML NETHERLANDS B.V. - Veldhoven

International Classification:

G06F 17/50

Abstract:

A method of metrology target design is described. The method includes providing a range or a plurality of values for design parameter of a metrology target and by a processor, selecting, by solving for and/or sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target.