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John R Delude

age ~63

from Ludlow, MA

Also known as:
  • John Delude
  • John Roger Delude
Phone and address:
74 Pinewood Rd, Ludlow, MA 01056
413-781-5620

John Delude Phones & Addresses

  • 74 Pinewood Rd, Ludlow, MA 01056 • 413-781-5620
  • 227 Bay Rd, Belchertown, MA 01007 • 413-323-9533 • 413-781-5620
  • 10 Meeting House Rd, Chicopee, MA 01013 • 413-781-5620
  • 12 Magnolia Ter, South Hadley, MA 01075 • 413-781-5620
  • 74 Pinewood Rd, Ludlow, MA 01056

Work

  • Position:
    Building and Grounds Cleaning and Maintenance Occupations

Education

  • Degree:
    Associate degree or higher

Emails

Us Patents

  • Radiation Cured Elastomeric Urethane Acrylate Films And The Process For Making Same

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  • US Patent:
    20080176972, Jul 24, 2008
  • Filed:
    Jan 19, 2007
  • Appl. No.:
    11/655753
  • Inventors:
    David Hews - Belchertown MA, US
    John Delude - Belchertown MA, US
    Leo Moreau - Broad Brook CT, US
    Dzu Luong - West Hartford CT, US
    Edward D. Phillips - Oakville CT, US
  • International Classification:
    C08F 2/46
  • US Classification:
    522 33
  • Abstract:
    A radiation-cured, elastomeric, urethane acrylate polymer has an elongation at break of between 100% (50) and 400% and a film break strength of between 200 and 2,600 psi at a thickness between about 0.002 inches and 0.010 inches.
  • Benzanthrone Polymerization Gate In Photopolymerizable Compositions

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  • US Patent:
    55432620, Aug 6, 1996
  • Filed:
    Feb 24, 1995
  • Appl. No.:
    8/393969
  • Inventors:
    Maria T. Sypek - Belchertown MA
    John R. Delude - Belchertown MA
    Paul A. Perron - Springfield MA
  • Assignee:
    International Paper Company - Purchase NY
  • International Classification:
    G03F 7016
    G03F 709
    G03F 730
  • US Classification:
    430162
  • Abstract:
    A light sensitive composition which is capable of photopolymerization which includes a photopolymerizable compound a free radical generating component and a benzanthrone or substituted benzanthrone which substantially prevents photopolymerization when the light sensitive composition is exposed to actinic radiation below a threshold amount but permits photopolymerization when the light sensitive composition is exposed to actinic radiation above a threshold amount. This achieves a gate effect which eliminates or decreases unwanted partial exposure in the nonimage areas and hence improves reproduction quality.

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John Delude Photo 1

John Delude

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John Delude Photo 2

Jackie Heath Delude

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John Delude

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Gender:
Male
Birthday:
1943
John Delude Photo 4

John Delude

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Gender:
Male
Birthday:
1943

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