John R Delude

US Patent:

20080176972, Jul 24, 2008

Filed:

Jan 19, 2007

Appl. No.:

11/655753

Inventors:

David Hews - Belchertown MA, US
John Delude - Belchertown MA, US
Leo Moreau - Broad Brook CT, US
Dzu Luong - West Hartford CT, US
Edward D. Phillips - Oakville CT, US

International Classification:

C08F 2/46

US Classification:

522 33

Abstract:

A radiation-cured, elastomeric, urethane acrylate polymer has an elongation at break of between 100% (50) and 400% and a film break strength of between 200 and 2,600 psi at a thickness between about 0.002 inches and 0.010 inches.

US Patent:

55432620, Aug 6, 1996

Filed:

Feb 24, 1995

Appl. No.:

8/393969

Inventors:

Maria T. Sypek - Belchertown MA
John R. Delude - Belchertown MA
Paul A. Perron - Springfield MA

Assignee:

International Paper Company - Purchase NY

International Classification:

G03F 7016
G03F 709
G03F 730

US Classification:

430162

Abstract:

A light sensitive composition which is capable of photopolymerization which includes a photopolymerizable compound a free radical generating component and a benzanthrone or substituted benzanthrone which substantially prevents photopolymerization when the light sensitive composition is exposed to actinic radiation below a threshold amount but permits photopolymerization when the light sensitive composition is exposed to actinic radiation above a threshold amount. This achieves a gate effect which eliminates or decreases unwanted partial exposure in the nonimage areas and hence improves reproduction quality.