Jeffrey S Leclaire

US Patent:

6754428, Jun 22, 2004

Filed:

Mar 14, 2002

Appl. No.:

10/098750

Inventors:

Robert Brown - Boca Raton FL
Jeffrey E. LeClaire - Boca Raton FL
Huizong Lu - Coral Springs FL
John L. Sullivan - Boca Raton FL

Assignee:

Zygo Corporation - Middlefield CT

International Classification:

G02B 600

US Classification:

385137, 385 65, 385 83

Abstract:

An apparatus includes a substrate having at least one opening through a top surface to a bottom surface, the substrate also having a first plurality of aligned grooves formed in the top surface and a plurality of fibers, where each of the plurality of fibers are positioned over the opening and in contact with the substrate within a corresponding one of the first plurality of grooves. In another aspect, a method of manipulating fibers includes placing a plurality of fibers on a substrate to extend over an opening formed through a top surface of the substrate to a bottom surface of the substrate, and flowing air through the opening to draw the plurality of fibers down towards the top surface of the substrate, and positioning each of said plurality of fibers in substantial alignment.

US Patent:

6798970, Sep 28, 2004

Filed:

Feb 26, 2002

Appl. No.:

10/085625

Inventors:

Robert Brown - Boca Raton FL
Jeffrey E. Leclaire - Boca Raton FL
Huizong Lu - Coral Springs FL
John L. Sullivan - Boca Raton FL

Assignee:

Zygo Corporation - Middlefield CT

International Classification:

G02B 600

US Classification:

385147, 385137, 269 21

Abstract:

An apparatus for placing a fiber on a substrate, the apparatus including a base, a supporting member attached to the base, a first placement head attached to the support member, the first placement head having an extendable plunger slidably coupled to the first placement head, the first placement head having an airflow channel formed proximate to a tip of the plunger, a substrate carrier attached to the base, wherein, during operation of the apparatus, the substrate carrier holds a substrate beneath the plunger mechanism, and wherein, during operation of the apparatus, a vacuum source is connected to the placement head to draw a flow of air through the airflow channel, and wherein, during operation of the apparatus, the placement head picks up and holds a fiber against the plunger tip using forces associated with the flow of air.

US Patent:

6829419, Dec 7, 2004

Filed:

Feb 4, 2002

Appl. No.:

10/067522

Inventors:

Robert Brown - Boca Raton FL
Jeffrey E. Leclaire - Boca Raton FL
Huizong Lu - Coral Springs FL
John L. Sullivan - Boca Raton FL

Assignee:

Zygo Corporation - Middlefield CT

International Classification:

G02B 626

US Classification:

385 52, 385147, 257 48

Abstract:

A method of aligning fibers on a substrate includes placing a grooved substrate on a base next to an opening formed through a top surface of the base, flowing air through the opening to draw the plurality of fibers down towards the top surface of the substrate or base, placing a set of fibers to extend over the substrate or base and over the opening and bonding the plurality of fibers to the substrate.

US Patent:

7323699, Jan 29, 2008

Filed:

Feb 2, 2005

Appl. No.:

11/047877

Inventors:

Barry F. Hopkins - Hobe Sound FL, US
David J. Ray - Agoura Hills CA, US
Jeffrey E. LeClaire - Boca Raton FL, US
Roy White - Wellington FL, US

Assignee:

Rave, LLC - Delray Beach FL

International Classification:

G01N 13/16

US Classification:

2504922, 2504921, 2504923, 250306, 73105

Abstract:

A method and apparatus includes positioning a reactant on a surface in specific location and then directing an energy source from a device at the reactant such that it modifies the surface to either remove material or add material.

US Patent:

7495240, Feb 24, 2009

Filed:

May 2, 2006

Appl. No.:

11/415203

Inventors:

Barry F. Hopkins - Hobe Sound FL, US
David J. Ray - Agoura Hills CA, US
Jeffrey E. LeClaire - Boca Raton FL, US
Roy White - Wellington FL, US

Assignee:

Rave LLC - Delray Beach FL

International Classification:

G01N 13/16
H01L 21/302
H01L 21/461

US Classification:

2504922, 2504921, 2504923, 250306, 250307, 250310, 73105

Abstract:

A method and apparatus includes positioning a reactant on a surface in specific location and then directing an energy source from a device at the reactant such that it modifies the surface to either remove material or add material.

US Patent:

8293019, Oct 23, 2012

Filed:

Nov 24, 2008

Appl. No.:

12/277106

Inventors:

Jeffrey E. LeClaire - Boca Raton FL, US
Kenneth G. Roessler - Boca Raton FL, US
David Brinkley - Baltimore MD, US

Assignee:

Rave, LLC - Delray Beach FL

International Classification:

B08B 7/00

US Classification:

134 1, 134 13, 134 42, 134902

Abstract:

Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, a substrate has at least one radiation-produced particle disposed thereon, and a laser that has a wavelength that substantially coincides with a high absorption coefficient of the substrate is directed towards the substrate. A thermal increase is generated in the substrate, and the radiation-produced particle is removed from the substrate by transferring thermal energy from the substrate to the radiation-produced particle until the radiation-produced particle decomposes.

US Patent:

8562749, Oct 22, 2013

Filed:

May 20, 2012

Appl. No.:

13/475997

Inventors:

Jeffrey E. LeClaire - Boca Raton FL, US
Kenneth G. Roessler - Boca Raton FL, US
David Brinkley - Baltimore MD, US

Assignee:

Rave LLC - Delray Beach FL

International Classification:

B08B 7/00

US Classification:

134 1, 134 13, 134 42, 134902

Abstract:

A wafer fabrication process with removal of haze formation from a pellicalized photomask surface is provided. The wafer fabrication process includes pre-print wafer processing, wafer print processing using at least one photomask having a pellicle, photomask clean processing, wafer print processing using the photomask, and post-print wafer processing. The photomask clean processing step includes directing a laser through the pellicle towards an inorganic particle disposed on the photomask to remove the particle from the photomask by thermal decomposition.

US Patent:

7993464, Aug 9, 2011

Filed:

Mar 25, 2008

Appl. No.:

12/055178

Inventors:

Jeffrey E. LeClaire - Boca Raton FL, US
Kenneth Gilbert Roessler - Boca Raton FL, US
David Brinkley - Baltimore MD, US

Assignee:

Rave, LLC - Delray Beach FL

International Classification:

B08B 7/00

US Classification:

134 1, 134 13, 134 42, 134902

Abstract:

A method for laser surface cleaning of a target surface that has limited or no access to the environment directly above the surface to be cleaned. The method includes the ability to clean the surface with a reduced risk of substrate damage. The method includes direct laser excitation of a contaminated substrate surface and thermal transfer from the substrate to the contaminating particulate or contamination layer. The method also includes producing a thermally based removal and reducing a risk of substrate damage by keeping the temperature required to produce surface cleaning below the thermal damage level of the substrate material. In addition, the method includes reducing the risk of substrate damage by utilizing relatively long pulse-widths, providing for improved removal of small contaminants/particles, and directing the beam through a material disposed relative to the surface that is part of the substrates environmental enclosure.