George M Jordhamo

US Patent:

6365321, Apr 2, 2002

Filed:

Apr 13, 1999

Appl. No.:

09/291389

Inventors:

Kuang-Jung Chen - Poughkeepsie NY
Ronald Anthony DellaGuardia - Poughkeepsie NY
Hiroshi Ito - San Jose CA
George Michael Jordhamo - Hopewell Junction NY
Ahmad Dauod Katnani - Poughkeepsie NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7004

US Classification:

4302701, 430905, 430910

Abstract:

A photoresist binder composition comprising a homogeneous blend of (i) a hydroxystyrene copolymer comprising a first monomer that is optionally substituted hydroxystyrene and a second monomer containing an acid labile group, preferably pendant to the polymer backbone, and (ii) and a phenolic polymer, that is optionally partially or wholly protected, such as polyhydroxystyrene, poly(hydroxystyrene-co-styrene), poly(hydroxystyrene-co-styrene-co-t-butyl acrylate), novolac, and the like. Also provided is a lithographic resist composition comprising the homogeneous blend of the photoresist binder composition, and a radiation-sensitive acid generator which generates an acid upon exposure to radiation, and a process for using the resist composition to generate resist images on a substrate, such as in the manufacture of integrated circuits or the like.

US Patent:

20030003391, Jan 2, 2003

Filed:

Feb 8, 2001

Appl. No.:

09/778365

Inventors:

George Barclay - Jefferson MA, US
Robert Heumann - Mendon MA, US
Edward Rutter - Franklin MA, US
Jung-Kuang Chen - Poughkeepsie NY, US
Margaret Lawson - LaGrangeville NY, US
George Jordhamo - Hopewell Junction NY, US
Timothy Hughes - marlboro NY, US
Wayne Moreau - Wappingers Falls NY, US
Ann Mewherter - Austin TX, US

Assignee:

Shipley Company, L.L.C. - Marlborough MA

International Classification:

G03F007/038

US Classification:

430/270100, 430/311000

Abstract:

The invention provides photoresists and resist preparative methods. Methods of the invention include treatment of a resist resin with methylene chloride or other organic solvent to remove low molecular weight materials. It has been found that the treated resin can be formulated into resists that provide manufactured electronic devices with significantly reduced defects.

US Patent:

62108565, Apr 3, 2001

Filed:

Jan 27, 1999

Appl. No.:

9/238823

Inventors:

Qinghuang Lin - Wappingers Falls NY
Timothy M. Hughes - Marlboro NY
George M. Jordhamo - Hopewell Junction NY
Ahmad D. Katnani - Poughkeepsie NY
Wayne M. Moreau - Wappingers Falls NY
Niranjan Patel - Fremont CA

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03C 1725
G03F 7004

US Classification:

4302701

Abstract:

A radiation sensitive resist composition exhibiting high resolution and enhanced etch resistance comprising a silicon containing polymeric additive, a non-silicon containing base polymer, a photoacid generator and a base is provided. A method of forming a patterned resist film is also provided. A resist film having an upper surface region enriched with silicon is also disclosed.

US Patent:

50160907, May 14, 1991

Filed:

Mar 21, 1990

Appl. No.:

7/496838

Inventors:

George T. Galyon - Fishkill NY
George M. Jordhamo - Wappingers Falls NY
Kevin P. Moran - Wappingers Falls NY
Michael L. Zumbrunnen - Poughkeepsie NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H02B 100
G06F 100
H01L 2346

US Classification:

357 82

Abstract:

A cold plate and an integrated circuit cooling module embodying a cross-hatch coolant flow distribution scheme. Cross hatch flow distribution is achieved by way of two sets of channels which run perpendicular to each other. The first set of channels is formed on a base plate. The second, perpendicular set is includes a set of inlet channels and a set of interleaved outlet channels formed on a distribution plate. In the preferred embodiment, the base and distribution plates are separated by an interposer plate that has nozzles which cause a liquid coolant to impinge, under pressure, on the floor of the base plate.

US Patent:

51511690, Sep 29, 1992

Filed:

Dec 6, 1991

Appl. No.:

7/802792

Inventors:

George T. Galyon - Fishkill NY
George M. Jordhamo - Wappingers Falls NY
Louis H. Wirtz - Highland NY

Assignee:

International Business Machines Corp. - Armonk NY

International Classification:

C25D 1104
C25D 1700

US Classification:

205151

Abstract:

A method and apparatus in which an aluminum-clad copper pin-piston is supported on the upper surface of a roller or a pair of rollers. As the roller rotates, it rotates the pin-piston and the surface of the roller carries an electrolyte. The positive side of a power supply is connected to the pin-piston and the negative side of the supply is coupled to the roller surface via the electrolyte bath. Anodizing current passes from the rotating roller to the rotating pin-piston via the electrolyte, which is continuously replenished. An anodized film forms on the aluminum surface of the pin-piston. Oxide growth rate and film thickness are controlled by controlling the current density and the duration of pin-piston contact with the charged roller.

US Patent:

54545064, Oct 3, 1995

Filed:

Mar 1, 1994

Appl. No.:

8/204117

Inventors:

George M. Jordhamo - Wappingers Falls NY
Louis H. Wirtz - Calverton NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B23K 2010
H01R 402

US Classification:

2281101

Abstract:

A bonding method joins together a plurality of conductively coated polymers in a single operation. The method employs heat generation via a high energy source, whose output is focused by an energy director which causes fusing of the polymer surfaces along with fusing of the metal surfaces at their respective interfaces to form a robust electrical and mechanical bond.

US Patent:

51220652, Jun 16, 1992

Filed:

Aug 12, 1991

Appl. No.:

7/743633

Inventors:

Thomas J. Dudek - Poughkeepsie NY
George M. Jordhamo - Wappingers Falls NY
Basil D. Washo - Poughkeepsie NY

Assignee:

International Business Machines Corp. - Armonk NY

International Classification:

H01R 13648

US Classification:

439 76

Abstract:

A connector for terminating wires and cables is constructed of two mating thermoplastic members. One of the members carries a pattern of conductive material which forms edge contact pads, signal lines, ground lines and a ground buss interconnecting all ground lines. The other thermoplastic member is formed to include a series of ribs that parallel and contact the ground lines and ground buss. The surface of the thermoplastic member carrying the ribs and the ribs are plated with a copper layer and when assembled with the mating member forms grounded tunnel-like passages enclosing the signal lines and into which the signal conductors of the wires or cables extend to terminate on the signal lines.

US Patent:

55473962, Aug 20, 1996

Filed:

Oct 4, 1994

Appl. No.:

8/319180

Inventors:

George M. Jordhamo - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01R 1358

US Classification:

439604

Abstract:

A device and a method which utilizes semi-interpenetrating polymer networks for strain relief of fiber or cable. The need for adhesives and mechanical means for cable or fiber retention is eliminated while performance and reliability is enhanced. In one embodiment a first polymer network is fabricated in an undersized plug which is in turn placed inside a hollow connector housing with an open end and at least one aperture for a cable to pass through. The void created between the plug and the connector shell is then subsequently filled by adding a second polymer to fill the unit. The unit is then placed in a curing chamber so that the polymer can swell and completely fill any voids between the plug and the connector shell.