Donald P Beadles

US Patent:

20020142234, Oct 3, 2002

Filed:

Mar 28, 2002

Appl. No.:

10/112386

Inventors:

Gregory Hansel - Richfield MN, US
Chad DuBois - Crystal MN, US
Donald Beadles - Chanhassen MN, US

International Classification:

G03C005/00
G03F009/00

US Classification:

430/005000, 430/322000, 430/323000, 430/324000

Abstract:

A photomask and a method of making one for use in the photolithographic production of integrated circuits, printed circuit boards, etched metal parts and the like. The photomask has a film layer that is composed of a transparent polymer film prepared with a photolithographic image. In one embodiment the polymer film is emulsion based and the photolithographic image is photographically fixed to the film. The photomask includes a rigid transparent substrate such as a piece of glass of high optical quality. An adhesive bonds the polymer film to the glass. The photomask has qualities of a more expensive chrome-on-glass photomask.