David W Severns

US Patent:

51215314, Jun 16, 1992

Filed:

Aug 7, 1991

Appl. No.:

7/742569

Inventors:

David W. Severns - Sunnyvale CA
Paul R. Lindstrom - Aptos CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 1600

US Classification:

29 2501

Abstract:

A hollow graphite susceptor for supporting semiconductor substrates during processing in epitaxial reactor systems. The susceptor has reduced wall thickness to provide lower thermal mass for rapid heating and high wafer throughput. Early failure of this thin-walled susceptor is avoided by providing a raised reinforcing boss on its interior surface in alignment with each recess on the exterior surface.

US Patent:

54763592, Dec 19, 1995

Filed:

Oct 29, 1992

Appl. No.:

7/968223

Inventors:

David W. Severns - Sunnyvale CA
Brian Tompson - Campbell CA
Paul R. Lindstrom - Aptos CA
David K. Carlson - Santa Clara CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B65G 4700

US Classification:

414786

Abstract:

A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.

US Patent:

51042762, Apr 14, 1992

Filed:

Aug 16, 1991

Appl. No.:

7/745818

Inventors:

David W. Severns - Sunnyvale CA
Brian Tompson - Campbell CA
Paul B. Lindstrom - Aptos CA
David K. Carlson - Santa Clara CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 1600

US Classification:

414222

Abstract:

A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.

US Patent:

51161818, May 26, 1992

Filed:

May 19, 1989

Appl. No.:

7/354161

Inventors:

David W. Severns - Sunnyvale CA
Brian Tompson - Campbell CA
Paul R. Lindstrom - Aptos CA
David K. Carlson - Santa Clara CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 1600

US Classification:

414222

Abstract:

A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.

US Patent:

53741595, Dec 20, 1994

Filed:

Apr 8, 1993

Appl. No.:

8/044919

Inventors:

David W. Severns - Sunnyvale CA
Brian Tompson - Campbell CA
Paul R. Lindstrom - Aptos CA
David K. Carlson - Santa Clara CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 1600

US Classification:

414786

Abstract:

A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.