SEVERNS FAMILY FOUNDATION Membership Organizations, Nec, Nsk
1168 Tangerine Way, Sunnyvale, CA 94087
David Severns Engineer
Nevada Department of Transportation Regulation/Administrative Transportation · Records Management Office · Transportation Services · Highway/Street Construction · Financial Management Office for The Transportation Department · Location Office for The Transportation Department · Program Development Office for The Transportation Department · Resarch Office for The Transportation Department
David W. Severns - Sunnyvale CA Paul R. Lindstrom - Aptos CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
C23C 1600
US Classification:
29 2501
Abstract:
A hollow graphite susceptor for supporting semiconductor substrates during processing in epitaxial reactor systems. The susceptor has reduced wall thickness to provide lower thermal mass for rapid heating and high wafer throughput. Early failure of this thin-walled susceptor is avoided by providing a raised reinforcing boss on its interior surface in alignment with each recess on the exterior surface.
David W. Severns - Sunnyvale CA Brian Tompson - Campbell CA Paul R. Lindstrom - Aptos CA David K. Carlson - Santa Clara CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
B65G 4700
US Classification:
414786
Abstract:
A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.
David W. Severns - Sunnyvale CA Brian Tompson - Campbell CA Paul B. Lindstrom - Aptos CA David K. Carlson - Santa Clara CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
C23C 1600
US Classification:
414222
Abstract:
A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.
David W. Severns - Sunnyvale CA Brian Tompson - Campbell CA Paul R. Lindstrom - Aptos CA David K. Carlson - Santa Clara CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
C23C 1600
US Classification:
414222
Abstract:
A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.
David W. Severns - Sunnyvale CA Brian Tompson - Campbell CA Paul R. Lindstrom - Aptos CA David K. Carlson - Santa Clara CA
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
C23C 1600
US Classification:
414786
Abstract:
A susceptor carrying semiconductor wafers for processing is suspended from a compliant attachment at its upper end and is lowered into a reaction chamber for processing. At the completion of processing, the susceptor is withdrawn vertically to permit a robot to unload the processed wafers and load unprocessed wafers. In order to fix the position of the susceptor during the loading operations, a support carriage is moved into position to engage the lower end of the susceptor. Noxious and corrosive chloride vapors are simultaneously withdrawn from the reaction chamber by a vacuum line attached to the support carriage.
David Severns (1975-1979), Jan Havens (1977-1981), Marybeth Smith (1973-1977), Lee Goins (1996-2000), Cathy Gantt (1979-1983), Vicki Johnson (1972-1976)