David E Kolesar

US Patent:

7275928, Oct 2, 2007

Filed:

Nov 23, 2004

Appl. No.:

10/996199

Inventors:

David M. Kolesar - Gulph Mills PA, US
Robert L. Post - Ivyland PA, US
Alan H. Saikin - Landenberg PA, US
Aaron Sarafinas - Ivyland PA, US

Assignee:

Rohm and Haas Electronic Materials CMP Holdings, Inc. - Newark DE

International Classification:

B29C 44/06
B01F 13/02

US Classification:

425447, 366137, 366139

Abstract:

The present invention provides an apparatus for forming a chemical mechanical polishing pad, comprising a tank with polymeric materials, a storage silo with microspheres and a curative storage tank with curing agents. The apparatus further provides a premix prep tank for forming a pre-mixture of the polymeric materials and the microspheres and a recirculation loop in the premix prep tank for recirculating the pre-mixture until a desired bulk density is reached. The apparatus further provides a premix run tank for storing the pre-mixture, a mixer for forming a mixture of the pre-mixture and the curing agents and a mold for molding the mixture.