Arun K Malhotra

US Patent:

6417109, Jul 9, 2002

Filed:

Jul 26, 2000

Appl. No.:

09/625932

Inventors:

Stephen G. Jordan - Fremont CA
G. Robert Gray - Fremont CA
Arun Malhotra - San Jose CA

Assignee:

Aiwa Co., Ltd. - Tokyo

International Classification:

H10L 21302

US Classification:

438692, 438700, 438706, 438712, 438723, 438724

Abstract:

Chemical-mechanical processing of a patterned substrate selectively etches patterned portions of the substrate surface, producing deep narrow features with a rapid etch rate. This chemical-mechanical processing is termed chemical-mechanical etching and produces a result that is substantially the opposite of the planarization that is achieved by conventional chemical-mechanical polishing (CMP). A chemical-mechanical polishing (CMP) technique which is widely used for planarization of surfaces is converted for usage as an etching technique, a chemical-mechanical etching (CME) technique, by forming a patterned mask on the substrate surface prior to mechanical polishing. The usage of chemical-mechanical polishing techniques in this manner yields an etching method with properties including a rapid etch rate, a highly controllable etch rate, a highly controllable etch depth, and a greatly selective etch directionality. A coating that inhibits the removal of the substrate material protects selectively patterned areas of a substrate, thereby creating a recess in substrate areas that are not protected by the coating.

US Patent:

6529449, Mar 4, 2003

Filed:

Jul 26, 2000

Appl. No.:

09/625368

Inventors:

Stephen G. Jordan - Fremont CA
Robert Gray - Fremont CA
Arun Malhotra - San Jose CA

Assignee:

Aiwa Co. Ltd. - Tokyo

International Classification:

G11B 1100

US Classification:

369 1333, 369 1313

Abstract:

A magneto-optical head with a centrally-located solid immersion lens and a coil formed radially about the lens advantageously utilizes an insulating material with a relatively high thermal conductivity for isolating the coil and avoiding heat damage to the head when current is passed through the head during a write operation. First and second coils in first and second coil layers are coupled by a via to form a continuous coil. A combination of a chemical-mechanical contouring operation and the lack of any intervening low thermal conductivity material adjacent the coil effectively produces an insulation layer that is thin but has a contour with a very smooth surface, resulting in a highly compact multiple-level coil.

US Patent:

6744550, Jun 1, 2004

Filed:

May 28, 2002

Appl. No.:

10/157354

Inventors:

Armand P. Neukermans - Portola Valley CA
Timothy G. Slater - San Francisco CA
Marc R. Schuman - San Francisco CA
Jack D. Foster - Los Altos CA
Sam Calmes - Los Altos CA
Sateesh S. Bajikar - San Jose CA
Arun Malhotra - San Jose CA
Jane Ang - San Jose CA
Jerry Hurst - San Jose CA
John Green - Scotts Valley CA

Assignee:

Xros, Inc. - Santa Clara CA

International Classification:

G02B 2500

US Classification:

359291, 359290

Abstract:

A micro-mirror strip assembly having a plurality of two-dimensional micro-mirror structures with improved deflection and other characteristics is presented. In the micro-mirror structures, electrodes for electrostatic deflection are disposed on conical or quasi-conical entities that are machined, attached or molded into a substrate. The electrodes are quartered approximately parallel to or offset by 45 degrees from rotational axes to form quadrants. Torsion sensors are provided along the axes of rotation to control deflection of the quadrant deflection electrodes.

US Patent:

7031045, Apr 18, 2006

Filed:

Oct 28, 2003

Appl. No.:

10/695109

Inventors:

Armand P. Neukermans - Portola Valley CA, US
Timothy G. Slater - San Francisco CA, US
Marc R. Schuman - San Francisco CA, US
Jack D. Foster - Los Altos CA, US
Sam Calmes - Los Altos CA, US
Sateesh S. Bajikar - San Jose CA, US
Arun Malhotra - San Jose CA, US
Jane Ang - San Jose CA, US
Jerry Hurst - San Jose CA, US
John Green - Scotts Valley CA, US

International Classification:

G02B 26/00

US Classification:

359291, 359290, 359295

Abstract:

A micro-mirror strip assembly having a plurality of two-dimensional micro-mirror structures with improved deflection and other characteristics is presented. In the micro-mirror structures, electrodes for electrostatic deflection are disposed on conical or quasi-conical entities that are machined, attached or molded into a substrate. The electrodes are quartered approximately parallel to or offset by 45 degrees from rotational axes to form quadrants. Torsion sensors are provided along the axes of rotation to control deflection of the quadrant deflection electrodes.

US Patent:

20020137344, Sep 26, 2002

Filed:

May 24, 2002

Appl. No.:

10/155755

Inventors:

Stephen Jordan - Fremont CA, US
G. Gray - Fremont CA, US
Arun Malhotra - San Jose CA, US

International Classification:

H01L021/302
H01L021/461

US Classification:

438/689000

Abstract:

Etched substrate produced by chemical-mechanical processing of a patterned substrate which selectively etches patterned portions of the substrate surface, producing deep narrow features with a rapid etch rate. This chemical-mechanical processing is termed chemical-mechanical etching and produces a result that is substantially the opposite of the planarization that is achieved by conventional chemical-mechanical polishing (CMP). A chemical-mechanical polishing (CMP) technique which is widely used for planarization of surfaces is converted for usage as an etching technique, a chemical-mechanical etching (CME) technique, by forming a patterned mask on the substrate surface prior to mechanical polishing. The usage of chemical-mechanical polishing techniques in this manner yields an etching method with properties including a rapid etch rate, a highly controllable etch rate, a highly controllable etch depth, and a greatly selective etch directionality. A coating that inhibits the removal of the substrate material protects selectively patterned areas of a substrate, thereby creating a recess in substrate areas that are not protected by the coating.

US Patent:

54900280, Feb 6, 1996

Filed:

Aug 26, 1994

Appl. No.:

8/297183

Inventors:

Jane Ang - San Mateo CA
Arun Malhotra - San Jose CA
G. Robert Gray - Fremont CA
James Watterston - Sunnyvale CA

Assignee:

AIWA Research and Development, Inc. - Fremont CA

International Classification:

G11B 511
G11B 5147

US Classification:

360126

Abstract:

A thin film magnetic head is fabricated on a substrate by depositing a lower shield layer on the substrate. A lower layer of a magnetic yoke is situated on the lower shield layer to couple the yoke to the shield. Alternatively, the magnetic yoke is isolated from the lower shield layer by an insulative layer therebetween. At the same time that first and second magnetic side poles are built up layer by layer via successive plating operations at the respective ends of a lower magnetic layer of the yoke, a side shield structure is plated up, layer by layer, at the periphery of the lower shield layer to surround resultant side pole structure. A shield cover is plated on the top of the side shield to substantially enclose the side pole structure, but leave an opening for an insulative pedestal though which the tops of the side poles extend. First and second magnetic poles are plated to the tops of the first and second side poles such that a gap region of non-magnetic material is formed therebetween.

US Patent:

60915811, Jul 18, 2000

Filed:

Feb 10, 1997

Appl. No.:

8/795268

Inventors:

G. Robert Gray - Fremont CA
Arun Malhotra - San Jose CA

Assignee:

AIWA Co., Ltd. - Tokyo

International Classification:

G11B 5147
G11B 5187

US Classification:

360126

Abstract:

A thin film magnetic head is provided in which a magnetic yoke assembly is built up, layer by layer, atop a substrate using semiconductor thin film techniques. A lower yoke assembly is first fabricated including a lower magnetic layer situated on the substrate and first and second side poles built up vertically from the ends of the lower magnetic layer. A coil structure is situated about one of the side poles and is separated therefrom by planar insulative layers in which the coil structure is disposed. An insulative pedestal surrounded by a frame is formed at the top of the lower yoke assembly and extends above the uppermost lateral plane of the yoke assembly. A diamond-like carbon (DLC) wear layer is deposited atop the pedestal. A pole well is excavated in the DLC layer so as to expose the first and second side poles therebelow. A first magnetic pole including a gap end is plated in the pole well at the top of the first side pole and extending toward the second side pole.

US Patent:

55637540, Oct 8, 1996

Filed:

Aug 26, 1994

Appl. No.:

8/296840

Inventors:

G. Robert Gray - Fremont CA
Arun Malhotra - San Jose CA

Assignee:

AIWA Research and Development, Inc. - Fremont CA

International Classification:

G11B 542

US Classification:

360126

Abstract:

A thin film magnetic head is provided in which a magnetic yoke assembly is built up, layer by layer, atop a substrate using semiconductor thin film techniques. A lower yoke assembly is first fabricated including a lower magnetic layer situated on the substrate and first and second side poles built up vertically from the ends of the lower magnetic layer. An insulative pedestal surrounded by a frame is formed at the top of the lower yoke assembly and extends above the uppermost lateral plane of the yoke assembly. A diamond-like carbon (DLC) wear layer is deposited atop the pedestal. First and second pole wells are excavated in the DLC layer so as to expose the first and second side poles therebelow and to form a DLC gap region between the first and second side poles. First and second magnetic poles are then formed in the first and second pole wells, respectively.