Tri Cong Le

US Patent:

6630407, Oct 7, 2003

Filed:

Mar 30, 2001

Appl. No.:

09/820689

Inventors:

Douglas Keil - Fremont CA
Jim Bowers - Brookfield CT
Eric Wagganer - Milpitas CA
Rao Annapragada - Union City CA
Tri Le - Milpitas CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

H01L 21302

US Classification:

438717, 216 47

Abstract:

A semiconductor manufacturing process wherein an organic anti-reflective coating (ARC) is plasma etched with selectivity to an underlying dielectric layer and/or overlying photoresist. The etchant gas is fluorine-free and includes a carbon-containing gas such as CO gas, a nitrogen-containing gas such as N , an optional oxygen-containing gas such as O , and an optional inert carrier gas such as Ar. The etch rate of the ARC can be at least 10 times higher than that of the underlying layer. Using a combination of CO and O with N and a carrier gas such as Ar, it is possible to obtain dielectric:ARC selectivity of at least 10. The process is useful for etching contact or via openings in damascene and self-aligned contact or trench structures.

US Patent:

6930048, Aug 16, 2005

Filed:

Sep 18, 2002

Appl. No.:

10/246844

Inventors:

SiYi Li - Fremont CA, US
S.M. Rega Sadjadi - Saratoga CA, US
Sean S. Kang - Fremont CA, US
Tri Le - Milpitas CA, US
Scott Briggs - Menlo Park CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

H01L021/302

US Classification:

438710, 438717, 438720, 438723, 438725

Abstract:

The invention is a method of etching an integrated circuit (IC) structure that includes a metal hard mask layer. The etching of the metal hard mask layer is performed by first feeding a gas mixture comprising a fluorine containing gas and oxygen (O) gas to a reactor. The method then proceeds to generate a plasma that etches the metal hard mask layer. The method can be applied to either performing a via etch or a trench etch. Additionally, the invention teaches the removal of a photoresist layer without affecting the metal hard mask layer.

US Patent:

20120194087, Aug 2, 2012

Filed:

Jan 24, 2012

Appl. No.:

13/356796

Inventors:

Wei Lu - Saratoga CA, US
Stephen Leeboon Wong - Saratoga CA, US
William Mai - San Jose CA, US
Tri Le - San Jose CA, US

International Classification:

H05B 37/02

US Classification:

315192, 315297

Abstract:

System and methods are provided for driving one or more light emitting diodes (LEDs) to reduce audible noise. An example system includes a switching component, a system controller, and a current generator. The switching component is configured to receive a dimming signal with a predetermined dimming frequency and configured to switch on or off the one or more LEDs in response to the dimming signal, the predetermined dimming frequency being outside a frequency band of the audible noise. The system controller is configured to receive a feedback signal related to a LED current that flows through the one or more LEDs and configured to generate a drive signal. Additionally, the current generator is configured to receive the drive signal, to generate a charging current to store energy during a charging period and to generate the LED current during a discharging period.

US Patent:

20150341995, Nov 26, 2015

Filed:

Jul 31, 2015

Appl. No.:

14/815212

Inventors:

- St. Michael, BB
Stephen Leeboon Wong - Saratoga CA, US
William Mai - San Jose CA, US
Tri Le - San Jose CA, US

International Classification:

H05B 33/08

Abstract:

System and methods are provided for driving one or more light emitting diodes (LEDs) to reduce audible noise. An example system includes a switching component, a system controller, and a current generator. The switching component is configured to receive a dimming signal with a predetermined dimming frequency and configured to switch on or off the one or more LEDs in response to the dimming signal, the predetermined dimming frequency being outside a frequency band of the audible noise. The system controller is configured to receive a feedback signal related to a LED current that flows through the one or more LEDs and configured to generate a drive signal. Additionally, the current generator is configured to receive the drive signal, to generate a charging current to store energy during a charging period and to generate the LED current during a discharging period.