Tai Thanh Nguyen

US Patent:

6610169, Aug 26, 2003

Filed:

Apr 21, 2001

Appl. No.:

09/840349

Inventors:

Tue Nguyen - Fremont CA
Tai Dung Nguyen - Fremont CA
Craig Alan Bercaw - Los Gatos CA

Assignee:

Simplus Systems Corporation - Fremont CA

International Classification:

H01L 2100

US Classification:

15634538, 15634548, 1563455, 118722, 118723 R, 118723 I, 118723 MP

Abstract:

Systems and methods are disclosed to perform semiconductor processing with a process chamber; a flash lamp adapted to be repetitively triggered; and a controller coupled to the control input of the flash lamp to trigger the flash lamp. The system can deploy a solid state plasma source in parallel with the flash lamp in wafer processing.

US Patent:

6670266, Dec 30, 2003

Filed:

Nov 13, 2002

Appl. No.:

10/292929

Inventors:

Tue Nguyen - Fremont CA
Tai Dung Nguyen - Fremont CA

Assignee:

Simplus Systems Corporation - Fremont CA

International Classification:

H01L 214763

US Classification:

438627, 438644, 438654, 438769

Abstract:

A method has been provided for improving the adhesion of copper to a nitrided metal diffusion barrier material, such as TiN, in an integrated circuit substrate. The method provided a multilayered diffusion barrier structure, comprising a conducting diffusion barrier layer and a poorly conducting adhesion-promoter layer in selected locations. The formation of a poorly conducting adhesion-promoter layer in selected locations permits the optimization of both contact resistance and adhesion property. The poorly conducting adhesion-promoter layer is formed either by the partial incorporation of oxygen into the diffusion barrier or by deposition in an oxygen ambient.

US Patent:

6705816, Mar 16, 2004

Filed:

Jun 4, 2002

Appl. No.:

10/161972

Inventors:

Tue Nguyen - Fremont CA
Tai Dung Nguyen - Fremont CA

Assignee:

Waypoint Technologies - Fremont CA

International Classification:

B25J 1702

US Classification:

41422605, 4147445

Abstract:

A wafer transfer apparatus provides a rotational and translational motions using only one stationary motor drive. The apparatus includes a drive assembly and a transport arm assembly. The transport arm assembly includes a transport arm rotatably attached to a linking arm. The linking arm is fixedly attached to a sleeve, which is rotatably attached to a housing. A shaft runs axially through the sleeve, and coupled with the transport arm so that rotation of the sleeve relative to the shaft causes the movement of the transport arm assembly. A locking mechanism allows the shaft to be locked to the housing or to the sleeve. A motor fixedly attached to the housing and operational attached to the sleeve. When the shaft is locked to the sleeve, the motor rotates the sleeve and the shaft simultaneously, which effects rotation of the transfer arm relative to the housing. When the shaft is locked to the housing, the motor rotates the sleeve relative to the shaft, causing translation of the transfer arm relative to the housing.

US Patent:

6756318, Jun 29, 2004

Filed:

Sep 10, 2001

Appl. No.:

09/954244

Inventors:

Tue Nguyen - Fremont CA
Tai Dung Nguyen - Fremont CA

Assignee:

Tegal Corporation - Petaluma CA

International Classification:

H01L 2131

US Classification:

438758, 427255, 438627

Abstract:

A process to deposit a thin film by chemical vapor deposition includes evacuating a chamber of gases; exposing a device to a gaseous first reactant, wherein the first reactant deposits on the device to form the thin film having a plurality of monolayers in thickness; evacuating the chamber of gases; exposing the device, coated with the first reactant, to a gaseous second reactant under a plasma treatment, wherein the thin film is treated by the first reactant; and repeating the previous steps.

US Patent:

6858085, Feb 22, 2005

Filed:

Aug 6, 2002

Appl. No.:

10/213003

Inventors:

Tue Nguyen - Fremont CA, US
Tai Dung Nguyen - Fremont CA, US
Craig Alan Bercaw - Los Gatos CA, US

Assignee:

Tegal Corporation - Petaluma CA

International Classification:

C23C016/00
C23C014/00
B65G049/07
C23F001/00
H01L021/306

US Classification:

118719, 118723 R, 118733, 414217, 414939, 15634531, 20429825, 20429826, 20429827, 20429828, 20429835

Abstract:

An apparatus for sequential and isolated processing of a workpiece comprises a two compartment chamber and a mechanism to transfer the workpiece from one compartment to the other compartment. The transfer mechanism comprises two doors that seal the pathway between the two compartments between movement so that the two compartments are isolated and the workpiece can be processed sequentially and isolatedly in each compartment. The apparatus further comprises components to enable the processing of a workpiece: a delivery system to delivery precursor, a plasma source to generate a plasma and a vacuum pump to maintain a sub-atmospheric pressure. The preferred method of processing a workpiece is to deposit or adsorb a thin layer in the first compartment and then to transfer the workpiece to the second compartment for a reaction or a plasma reaction on the existing thin layer.

US Patent:

6919101, Jul 19, 2005

Filed:

Feb 4, 2003

Appl. No.:

10/360133

Inventors:

Zhihong Zhang - Fremont CA, US
Tai Dung Nguyen - Fremont CA, US
Tue Nguyen - Fremont CA, US

Assignee:

Tegal Corporation - Petaluma CA

International Classification:

C23C016/40

US Classification:

42725529, 42725537, 427255394, 4273722, 4273977, 438763, 438787, 20419223

Abstract:

A method for improving the adhesion of an impermeable film on a porous low-k dielectric film in an interconnect structure is disclosed. The method provides an in-situ annealing step before the deposition of the impermeable film to release the volatile trapped molecules such as water, alcohol, HCl, and HF vapor, inside the pores of the porous low-k dielectric film. The method also provides an in-situ deposition step of the impermeable film right after the deposition of the porous low dielectric film without exposure to an atmosphere containing trappable molecules. The method further provides an in-situ deposition step of the impermeable film right after the removal a portion of the porous low-k dielectric film without exposure to an atmosphere containing trappable molecules. By the removal of all trapped molecules inside the porous low-k dielectric film, the adhesion between the deposited impermeable film and the low-k dielectric film is improved. This method is applicable to many porous low-k dielectric films such as porous hydrosilsesquioxane or porous methyl silsesquioxane, porous silica structures such as aerogel, low temperature deposited silicon carbon films, low temperature deposited Si—O—C films and methyl doped porous silica.

US Patent:

6921555, Jul 26, 2005

Filed:

Aug 6, 2002

Appl. No.:

10/212547

Inventors:

Tue Nguyen - Fremont CA, US
Tai Dung Nguyen - Fremont CA, US
Craig Alan Bercaw - Los Gatos CA, US

Assignee:

Tegal Corporation - Petaluma CA

International Classification:

C23C016/00

US Classification:

4272481, 4272555, 427569

Abstract:

An apparatus and method for sequential and isolated processing of a workpiece comprises a two compartment chamber and a mechanism to transfer the workpiece from a first compartment to a second compartment by rotating the workpiece on a workpiece mover through an internal pathway. The transfer mechanism comprises two doors coupled to the workpiece mover to seal the internal pathway between the first and second compartments so that the two compartments are isolated and the workpiece can be processed sequentially and in isolation. The apparatus further comprises components to enable the processing of a workpiece. The preferred method of processing a workpiece is to deposit or adsorb a thin layer in the first compartment and then transfer by rotating the workpiece on the workpiece mover to the second compartment for further processing. The workpiece can then be transferred once again to the first compartment for further processing, and again to the second compartment, repeating the processing and transferring steps until a desired thin film is achieved.

US Patent:

7153542, Dec 26, 2006

Filed:

Aug 6, 2002

Appl. No.:

10/212546

Inventors:

Tue Nguyen - Fremont CA, US
Tai Dung Nguyen - Fremont CA, US
Craig Alan Bercaw - Los Gatos CA, US

Assignee:

Tegal Corporation - Petaluma CA

International Classification:

B05D 1/38
C23C 16/44
C23C 16/458
C23C 16/52
C23C 14/54
C23C 16/56

US Classification:

4272481, 427569, 42725528, 427402, 20419212, 118719, 118730, 118733

Abstract:

An apparatus for sequential processing of a workpiece comprises an assembly line processing system. The apparatus comprises multiple workpieces moving in an assembly line fashion under multiple process stations. The multiple process stations provide different processes onto the workpieces for a sequential processing of the workpieces. The sequential processing action is carried out by the movement of the workpieces under the various process stations.